INTEGRATED CIRCUIT
INTEGRATED CIRCUIT
As PVD process can provide extremely pure, densified, bonding and high-performance coatings and allows control of density, thickness and deposition rate which is crucial for intergrated circuit, it becomes indispensible.
It is used in a variety of high-quality coatings production like Copper (Cu) , Al Pads, Metal Hardmasks and Silicide, which are key to thin film resistors, capacitors and temperature sensors.
Arisimit® PVD and PECVD (DLC) coatings allow to control the deposition of thin films and provide excellent electrical performance and long-lasting durability.
